Polishing pad



FIG. 1 is a top plan view of a polishing pad, showing our new design;

FIG. 2 is a bottom plan view thereof;

FIG. 3 is a front elevational view thereof, the left side elevational view, the right side elevational view and the rear elevational view being a mirror image of the front view shown;

FIG. 4 is an enlarged, partial view thereof taken at coordinates 4—4 in FIG. 1;

FIG. 5 is a greatly enlarged, view thereof taken at coordinates 5—5 in FIG. 1;

FIG. 6 is a cross-sectional view thereof taken along line 6—6 in FIG. 5;

FIG. 7 is a greatly enlarged, partial cross-sectional view of part 7 shown in FIG. 6;

FIG. 8 is a greatly enlarged, partial view thereof taken at coordinates 8-5 in FIG. 1;

FIG. 9 is a cross-sectional view thereof taken along line 9—9 in FIG. 8;

FIG. 10 is a further enlargement of the cross-sectional view of part 10 in FIG. 9;

FIG. 11 is a further enlargement of the cross-sectional view of part 11 in FIG. 7; and,

FIG. 12 is a further enlargement of the cross-sectional view of part 12 of FIG. 10. 

The ornamental design for a polishing pad, as shown and described. 